RS-TMDSO 1133-Tetramethyldisiloxane CAS # 3277-26-7
- Classification:
-
Tshuaj Koom Haum Pab neeg saib xyuas
- CAS Tsis .:
-
3277-26-7
- Lwm yam npe:
-
Tetramethyldisiloxane
- MF:
-
C4H14OSi2
- EINECS Tsis .:
-
221-906-4
- purity:
-
99%
- Qhov chaw ntawm keeb kwm:
-
Zhejiang, Tuam Tshoj
- ntaus:
-
adsorbent
- Adsorbent Ntau:
-
Activated Carbon
- pab:
-
Tawv Koom Haum Pab neeg ua hauj, Yas Koom Haum Pab neeg ua hauj
- Hom Npe:
-
RS
- Model Number:
-
RS-TMDSO
Tetramethyldisiloxane.
Yaj: 1,1,3,3-Tetramethyl-disiloxane;
1,3-Dihydrotetramethyldisiloxane
Countertype ntawm Wacker Siloxane HSi2
Introduction
SI-163 yog ib tug tsis muaj kob kua ntshiab ntshiab.
Raug lub cev Properties
|
Tshuaj Lub Npe: |
Tetramethyldisiloxane |
|
CAS Tsis .: |
3277-26-7 los yog 30110-74-8 |
|
EINECS Tsis .: |
221-906-4 |
|
Empirical Formula: |
C 4 H 14 OSi 2 |
|
Molecular Nyhav: |
134,33 |
|
Kub Point: |
70 ° C [760mmHg] |
|
Flash Point: |
-12 ° C |
|
Xim thiab Tsos: |
Tsis muaj kob los yog yellowish pob tshab kua |
|
Ceev [25 ° C]: |
0,757 |
|
Refractive Index [25 ° C]: |
1,3669 [25 ° C] |
|
purity: |
99% los ntawm GC |
ntawv thov
SI-163 yog siv nyob rau hauv rau Ntshav Enhanced Tshuaj Vapor Deposition (PECVD) ntawm cov iav rau ib tug ntau yam ntawm substrates thaum uas tsis muaj kub.
SI-163 yog tseem ua hauj lwm nyob rau hauv reductive halogenation ntawm aldehydes thiab epoxides.
210L Hlau Nruas: 200KG / Nruas
1000L IBC Nruas: 1000KG / Nruas